Other Products
SEMCTCEH specializes in the integrated development, production and sales of wet process equipment.
Fully Automatic Single Wafer Cleaning Equipment
| Item | Specification |
| Application Field | RCA cleaning, pre-deposition cleaning, post-etch cleaning, post-CMP cleaning, wet etching, pre-EPI cleaning, etc. |
| Equipment Configuration | 4~16 chambers (customizable) Supports 2~4 CST/SMIF/FOUP loading/unloading Supports automatic chemical supply system CCSS, LCSS Heating control, concentration control, flow control, pressure control, etc.; Separate exhaust for acid, alkali, and organic solutions; Supports chemical recycling; High-definition camera, E-FLOW (optional); Fully supports SECS/GEM communication protocol |
| Wafer Size | 100mm~300mm |
| Process Indicators | Etching uniformity: Within-wafer: <3%; Wafer-to-wafer: <3%; Lot-to-lot: <3%; |
| Particle Control | Added particles <20 counts @0.2μm (tested with silicon oxide film, incoming particles <50 counts) |
| Metal Ions | <5E9 atoms/cm2 |
